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SN75185N

SN75185N资料
SN75185N
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File Size : 105 KB
Manufacturer:TI
Description:Honeywells enhanced SOI RICMOS™ IV (Radiation Insen- sitive CMOS) technology is radiation hardened through the use of advanced and proprietary design, layout and pro- cess hardening techniques. The RICMOS™ IV process is a 5-volt, SIMOX CMOS technology with a 150 Å gate oxide and a minimum drawn feature size of 0.75 µm (0.6 µm effective gate lengthLeff). Additional features include tungsten via plugs, Honeywells proprietary SHARP pla- narization process, and a lightly doped drain (LDD) struc- ture for improved short channel reliability. A 7 transistor (7T) memory cell is used for superior single event upset hardening, while three layer metal power bussing and the low collection volume SIMOX substrate provide improved dose rate hardening.
 
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型 号:SN75185N
厂 家:TI
封 装:02+03+
批 号:123
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